Apparatus for treating exhaust gas

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

55440, 55443, 55444, 55446, 422169, 422177, 422180, B01D 5000

Patent

active

048572764

ABSTRACT:
The present invention is directed to a method for treating an exhaust gas containing dust composed of a glassy material and a sticky material consisting principally of CaO in a gas parallel flow type solid-gas contact reactor, the aforesaid method being characterized by including the step of forcing the dust to collide with a solid surface on the upstream side of the reactor in order to separate the dust into the glassy material and the sticky material consisting principally of CaO; and the present invention is also directed to an apparatus for the above method, the apparatus being characterized by including a collision device for colliding with the dust which is disposed in an exhaust gas flow path on an upstream side of the reactor.

REFERENCES:
patent: 1044208 (1912-11-01), Luhn
patent: 2648395 (1953-08-01), Pond, Jr.
patent: 2793709 (1957-05-01), White
patent: 2828818 (1958-04-01), Wright
patent: 3110581 (1963-11-01), Simpson
patent: 3441381 (1969-04-01), Keith et al.
patent: 3799512 (1974-03-01), Raybon
patent: 3998599 (1976-12-01), Fedor
patent: 4065918 (1978-01-01), Rifkin
patent: 4512787 (1985-04-01), Mathews
patent: 4544525 (1985-10-01), Honda et al.
patent: 4695301 (1987-09-01), Okajima et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for treating exhaust gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for treating exhaust gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for treating exhaust gas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-120093

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.