Apparatus for treating a sample by a pulsed electron beam

Details Apparatus for treating a sample by a pulsed electron beam Apparatus for treating a sample by a pulsed electron beam

1982-04-21

1985-07-02

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PR, 219121P, 219121PW, 219121EA, 219121ET, 31511181, 31511191, 315241R, 2504923, B23K 1500, B23K 900

Patent

active

045270449

ABSTRACT:
The invention relates to an apparatus for treating samples comprising in a vacuum enclosure a cathode, an actual anode and a grid, as well as means for supplying the sample to the enclosure, a high voltage generator, a capacitor C.sub.1 charged by way of the said generator, a spark gap switch for producing a high energy pulse between the cathode and the grid, said switch being connected to one terminal of said capacitor, an element for producing pulses controlling the spark gap switch and a capacitor C.sub.2 having a capacitance above that of capacitor C.sub.1, charged by way of the generator used for producing between the actual anode and the cathode an electric field for accelerating and extracting electrons used for the bombardment of the sample.

REFERENCES:
patent: 3950187 (1976-04-01), Kirkpatrick
patent: 3955091 (1976-05-01), Robinson et al.
patent: 4082958 (1978-04-01), Kirkpatrick
patent: 4301391 (1981-11-01), Seliger et al.
patent: 4335297 (1982-06-01), Little
patent: 4344019 (1982-08-01), Gavin et al.
Journal of Applied Physics, vol. 50, No. 2, Feb. 1979, Greenwald et al.
Solid State Technology, vol. 22, No. 4, Apr. 1979, Greenwald et al.

Affiliated with

Also associated with

Rating

Apparatus for treating a sample by a pulsed electron beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for treating a sample by a pulsed electron beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for treating a sample by a pulsed electron beam will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-383008