Apparatus for treating a plurality of semiconductor slices to a

Details Apparatus for treating a plurality of semiconductor slices to a Apparatus for treating a plurality of semiconductor slices to a

1976-01-29

1977-04-19

Kaplan, Morris

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

C23C 1308

Patent

active

040181839

ABSTRACT:
A method of uniformly exposing a plurality of semiconductor slices to a reacting gas flow, where the slices are arranged in a spaced stack within a tube and the gas is directed between said slices by a longitudinally positioned baffle wall having apertures the cross-section of which increase in the direction of gas flow.

REFERENCES:
patent: 3367304 (1968-02-01), Robbins
IBM Technical Disclosure Bulletin, "Emitter Diffusion System" Eshbach et al., vol. 13, No. 6, (Nov. 1970), p. 1459.

Affiliated with

Also associated with

Rating

Apparatus for treating a plurality of semiconductor slices to a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for treating a plurality of semiconductor slices to a , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for treating a plurality of semiconductor slices to a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-97575