Apparatus for transporting substrates

Coating apparatus – Gas or vapor deposition – Multizone chamber

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118715, 118725, 118729, 414217, C23C 1600

Patent

active

051332850

ABSTRACT:
Apparatus for transporting substrates 22, 23 in vacuum deposition systems with several stations, comprising plate-like substrate holders 16 which are moved across the stations in a vertical position along a given path and have two rails which interact with two rows of rollers provided underneath the substrate holders. The side of the first rail 13 facing away from the substrate holder 16 has a longitudinal groove 13a which interacts with rollers 7, 7', 7", . . . which are rotatably disposed at the frame 4 of the apparatus and disposed in a first row where they are spaced apart. The second rail 14 runs parallel to the first one and has a planar bearing surface 14a the plane E.sub.2 of which intersects the rotating axes V.sub.a of the first row at a right angle and approximately traverses the center of gravity S of the substrate holder 16. The bearing surface 14a interacts with S rollers 8, 8', . . . which are disposed in a second row and at the bottom of the frame 4 where they rotate around vertical axes 1.sub.a. A vertical plane E.sub.1 in the longitudinal groove 13a of the first rail 13 is laterally offset with respect to plane E.sub.2 of the planar bearing surface.

REFERENCES:
patent: 4042128 (1977-08-01), Shrader

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for transporting substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for transporting substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for transporting substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1681797

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.