Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-06-11
1993-09-14
Nguyen, Nam K.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429815, 20429825, 118 501, 118719, 118724, 118729, C23C 1434
Patent
active
052445593
ABSTRACT:
Substrate holders (16) having approximately plate-like, parallelepipedal configuration which can be moved in the vertical position along a given transport path through coating stations. The substrate holder (16) has frame-shaped sides parts (16a, 16b) disposed in parallel planes, in whose window-like openings (25, 26) the substrates (22, 23) are received. Wiping contacts (29, 29a and 30, 30a) are provided on stationary mountings (27, 28) and their resilient ends make contact with the electrically conductive coating (22a, 23a) upon movement through the station, and an electrical circuit can be closed briefly through these wiping contacts (29, 29a and 30, 30a) and the coating (22a, 23a), producing a heating and tempering of the material of the coating.
REFERENCES:
patent: 3907660 (1975-09-01), Gillery
patent: 4042128 (1977-08-01), Shrader
patent: 4381965 (1983-05-01), Maher, Jr. et al.
patent: 4426267 (1984-01-01), Munz et al.
patent: 4765273 (1988-08-01), Anderle
patent: 5097794 (1992-03-01), Mahler et al.
Fischer et al.: Taschenbuch Feingeratetechnik (1972) p. 186.
Leybold Aktiengesellschaft
Nguyen Nam K.
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