Apparatus for thin film formation using photo-induced chemical r

Details Apparatus for thin film formation using photo-induced chemical r Apparatus for thin film formation using photo-induced chemical r

1986-04-07

1988-01-05

Bueker, Richard R.

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118722, 118723, 118715, C23C 1648

Patent

active

047168528

ABSTRACT:
An apparatus according to the present invention for thin film formation using a photo-induced chemical reaction comprises a reaction chamber in which a substrate can be set, means to introduce a reactive gas into the reaction chamber for the purpose of causing a surface of the substrate to adsorb the reactive gas, means to evacuate the reaction chamber, means to irradiate the substrate surface having adsorbed the reactive gas with photon energy for the purpose of forming a nucleus required for growing a film on the substrate surface, means to generate metastable excited molecules which can react with the reactive gas to decompose it, and means to introduce the reactive gas and the metastable excited molecules into the reaction chamber for the purpose of growing the film on the substrate formed with the nucleus on the basis of the nucleus.

REFERENCES:
patent: 4447469 (1984-05-01), Peters
patent: 4565157 (1986-01-01), Brors
patent: 4636401 (1987-01-01), Yamazaki

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