Apparatus for thermal diffusion of semiconductor devices

Details Apparatus for thermal diffusion of semiconductor devices Apparatus for thermal diffusion of semiconductor devices

1976-08-16

1978-02-28

Stein, Mervin

Coating apparatus

With vacuum or fluid pressure chamber

118 491, 118500, 214 1BB, 427248G, 432253, C23C 1312

Patent

active

040759725

ABSTRACT:
The invention discloses an apparatus for thermal diffusion of semiconductor devices, wherein a plurality of wafer boats each made of a refractory material and adapted to carry a predetermined number of wafers to be processed are sequentially fed into a furnace tube containing a high temperature, diffusion gas atmosphere and continuously transported at a predetermined speed through the furnace tube so that each wafer may have substantially the same thermal treatment and high productivity may be attained.

REFERENCES:
patent: 3051811 (1962-08-01), Koesling
patent: 3202406 (1965-08-01), Tack
patent: 3473510 (1969-10-01), Sheng et al.
patent: 3645545 (1972-02-01), Garnache et al.
patent: 3710757 (1973-01-01), Porter
patent: 3744650 (1973-07-01), Henebry et al.
patent: 3811825 (1974-05-01), Enderlein
patent: 3819067 (1974-06-01), Hammond
patent: 3951587 (1976-04-01), Alliegro et al.
patent: 3982888 (1976-09-01), Moussou et al.

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