Apparatus for thermal diffusion by high frequency induction heat

Coating apparatus – With cutting – punching or tearing of work – Web or sheet work

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118500, 432126, 432239, C23C 1308

Patent

active

041474325

ABSTRACT:
This invention relates to an apparatus for thermal diffusion by means of high frequency induction heating suitable for mass production of semiconductor substrates of uniform quality; wherein a plurality of heating bases, each made of a material having good electric conductivity, and carrying semiconductor substrates, are continuously fed through a furnace tube where the bases are heated by means of high frequency wave excitation in order that each semiconductor substrate receives substantially the same thermal treatment.

REFERENCES:
patent: 3051811 (1962-08-01), Koesling
patent: 3202406 (1965-08-01), Tack
patent: 3226254 (1965-12-01), Reuschel
patent: 3473510 (1969-10-01), Sheng et al.
patent: 3645545 (1972-02-01), Garnache et al.
patent: 3710757 (1973-01-01), Porter
patent: 3749383 (1973-07-01), Voigt et al.
patent: 3765763 (1973-10-01), Nygaard
patent: 3811825 (1974-05-01), Enderlein

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for thermal diffusion by high frequency induction heat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for thermal diffusion by high frequency induction heat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for thermal diffusion by high frequency induction heat will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1744574

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.