Surgery: light – thermal – and electrical application – Light – thermal – and electrical application – Light application
Patent
1992-11-12
1994-09-06
Cohen, Lee S.
Surgery: light, thermal, and electrical application
Light, thermal, and electrical application
Light application
A61N 506
Patent
active
053444337
ABSTRACT:
A method and apparatus for the treatment of psoriasis skin wounds are described. The method is based on the use of a short arc lamp having the capability of providing a narrow beam light source. The light source possesses a high intensity, the minimum irradiance applied being at least 1 mW/cm.sup.2 to be obtained by a light guide. The light guide is made from fused glass or an anaerobic liquid, with a diameter in the range of 2 to 10 mm and provides a transmittance of above 70%. The apparatus using this method, comprises a lamp selected from Xenon or Mercury-Xenon type, a glass lens, a black filter and a light guide having a diameter in the range of between 2 to 10 mm. It can be connected to a microprocessor, which by monitoring the time of treatment, delivers the correct dose of light.
REFERENCES:
patent: 3911318 (1975-10-01), Spero et al.
patent: 4048537 (1977-09-01), Blaisdell et al.
patent: 4298005 (1981-11-01), Mutzhas
patent: 4428050 (1984-01-01), Pellegrino et al.
patent: 4558700 (1985-12-01), Mutzhas
patent: 4686986 (1987-08-01), Fenyo et al.
patent: 4712014 (1987-12-01), Eich
patent: 4799754 (1989-01-01), Goldenberg
patent: 4830460 (1989-05-01), Goldenberg
patent: 4909254 (1990-03-01), Wilkinson
patent: 5026135 (1991-06-01), Booth
Cohen Lee S.
Dimotech Ltd.
Green Brian M.
Talmore Eli
LandOfFree
Apparatus for the treatment of skin wounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for the treatment of skin wounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the treatment of skin wounds will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1326882