Apparatus for the treatment of semiconductor materials

Details Apparatus for the treatment of semiconductor materials Apparatus for the treatment of semiconductor materials

1986-11-12

1988-07-26

Goldberg, E. A.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

118729, 118733, 118724, 219411, H05B 362

Patent

active

047602449

ABSTRACT:
A system for the heat treatment and doping of semiconductor wafers or the like has a heating system which can be moved axially over a quartz pipe by means of a linear shifting means, in which quartz pipe the materials to be treated are arranged. The ambient atmosphere is at least partially removed from the quartz pipe in the process, after which the semiconductor wafers are subjected to the desired treatment atmosphere; the heated oven is thereafter moved over the quartz pipe to complete the treatment.

REFERENCES:
patent: 2981819 (1961-04-01), Gregory
patent: 3862397 (1975-01-01), Anderson
patent: 4167915 (1979-09-01), Toole
patent: 4347431 (1982-08-01), Pearce
patent: 4375027 (1983-02-01), Zeto
patent: 4545327 (1985-10-01), Campbell
patent: 4573431 (1986-03-01), Sarkozy

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