Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1997-07-15
1999-06-22
Valentine, Donald R.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204202, C25D 1728
Patent
active
059140160
ABSTRACT:
In order in a continuous electroplating plant to avoid the problem of undesired metal application or metallization on contact faces (25), which e.g. occur in the case of rolling contacting of the article (13) to be plated, e.g. a printed circuit board, on contact rollers or disks (15) are provided individual contact sectors (24), which are alternately anodically and cathodically supplied with power via a commutator (27) located outside the treatment chamber (11). The contact sectors (24) are mutually overlapping and are staggered e.g. in sloping, arrow-like or step-like manner, so that a continuous contacting with respect to the article (13) is possible.
Contacting takes place in a lateral portion (45) of the treatment chamber (11), which is admittedly filled with treatment fluid (40), but is largely shielded with respect thereto, so that the metal application tendency is reduced. A partly permeable partition (56) protects the contact faces (25) from being contaminated by particles detached from the auxiliary, deplating cathode (55).
REFERENCES:
patent: 4755271 (1988-07-01), Hosten
patent: 4898657 (1990-02-01), Hosten
patent: 4976840 (1990-12-01), Hosten
Gebr. Schmid GmbH & Co.
Lipsitz Barry R.
Valentine Donald R.
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