Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-01-03
1999-11-30
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
118724, 55186, C23C 1600, H05H 100
Patent
active
059923466
ABSTRACT:
The invention relates to an apparatus (10) for the surface treatment of workpieces. For providing an apparatus (10) which is suited to perform the plasma treatment of porous workpieces by use of simple means and with continuously high quality, it is provided according to the invention that the workpieces, while arranged in a vaccum container, are subjected first to a cleaning process for evaporating and sucking the adhering foreign substances and subsequently to a plasma treatment process. The apparatus (10) is characterized in that a separator (16) is arranged in the suction pipe (14) between the vacuum container (12) and the vacuum source (18) for separating foreign substances from the gas mixture sucked from the vacuum container (12).
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