Apparatus for the simultaneous microwave deposition of thin film

Details Apparatus for the simultaneous microwave deposition of thin film Apparatus for the simultaneous microwave deposition of thin film

1994-07-22

1995-05-02

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Running length work

118723MP, 118723MW, 118723ME, 118723AN, 118724, 118725, 118730, C23C 1650

Patent

active

054115914

ABSTRACT:
Apparatus for the simultaneous plasma assisted chemical vapor deposition of thin film material onto an elongated web of substrate material at a plurality of discrete spatially separated deposition zones. In order to accomplish said simultaneous deposition, the web of substrate material is operatively positioned so as to assume a serpentine path of travel through a reduced pressure enclosure. By using an elongated linear applicator as a source of microwave energy, a high rate of uniform deposition of said thin film material over a plurality of large areas of the web of substrate material can be simultaneously achieved without heating of said web above the melting point thereof. In a preferred embodiment, the web of substrate material is formed of a low temperature, microwave transmissive synthetic plastic resin and the thin film material deposited thereupon forms a barrier coating for preventing oxygen diffusion therethrough.

REFERENCES:
patent: 4515107 (1985-05-01), Fournier et al.
patent: 4893584 (1990-01-01), Doehler et al.
patent: 5130170 (1992-07-01), Kanai et al.

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