Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-05-09
1992-12-08
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419213, 20429807, 20429808, 20429818, 20429819, C23C 1454
Patent
active
051695090
ABSTRACT:
A pair of magnetron cathodes in an evacuable coating chamber are each connected to an ungrounded output of an A.C. power supply. The discharge voltage of at least one of the cathodes is measured and the flow of reactive gas into the chamber is controlled so that the measured voltage is identical to a desired voltage.
REFERENCES:
patent: 3860507 (1975-01-01), Vossen, Jr.
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4738761 (1988-04-01), Bobbio et al.
patent: 4956070 (1990-09-01), Nakada et al.
patent: 4981566 (1991-01-01), Wurczinger
Latz Rudolf
Schanz Michael
Scherer Michael
Szczyrbowski Joachim
Leybold Aktiengesellschaft
Weisstuch Aaron
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