Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Reexamination Certificate
2009-08-28
2011-12-13
Gupta, Yogendra (Department: 1744)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
C117S208000
Reexamination Certificate
active
08075689
ABSTRACT:
In an apparatus for the production of a silica crucible comprising a carbon mold suitable for producing the silica crucible by the rotating mold method, the carbon mold has a thermal conductivity of not more than 125 W/(m·K).
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Extended European Search Report mailed Nov. 18, 2009, in corresponding European Application No. 09168902.6.
Christensen O'Connor Johnson & Kindness PLLC
Gupta Yogendra
Japan Super Quartz Corporation
Luk Emmanuel S
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