Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-03-14
1990-07-31
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
65 312, 65 32, 118665, 118688, 118712, 118725, 427 451, 427163, C23C 1650
Patent
active
049442449
ABSTRACT:
It realizes the chemical vapour phase deposition method using a plasma maintained by surface waves in a tube (2) for obtaining a preform and comprises photodetection means (50) sensitive to the light emitted by the deposition area (54) of the vitreous coating resulting from the reaction between appropriate gaseous compounds and able to supply information relative to the emission area of said light, and means (52) for controlling the displacement of the deposition area, displacement being such that the thickness of the coating is uniform in the tube, and control means controlling the power of the microwave generator (30) of the apparatus as a function of the information. Application to the field of telecommunications.
REFERENCES:
Chollet, P. and S. Saada, "Model and Rate Constant Determination for SPCVD Fiber Preform Fabrication", Optical Fiber Communication Conference and Sixth International Conference on Integrated Optics and Optical Fiber Communication Technical Digest, Reno, Nev. (Jan. 19-22, 1987) p. 105.
Pavy, D. et al., "Fabrication of Optical Fiber Preforms by a New Surface-Plasma CVD Process", 12th European Conference on Optical Communication Technical Digest, vol. 1, Palacio de Congresos, Barcelona, Spain (Sep. 22-25, 1986) pp. 19-22.
Chollet Patrick
Davoust Marie-Eve
Moisan Monique
Pavy Dominique
Saada Serge
Bueker Richard
Etat Francais Represente Par Le Ministere Des Postes
Owens Terry J.
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