Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-11-12
1988-12-27
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118729, 118730, 20419210, 20419212, C23C 1450
Patent
active
047939117
ABSTRACT:
In an apparatus for the production of coatings with a uniform thickness profile on substrates by cathode sputtering, a substrate carriage held and guided between wheels is provided, which can be moved through the coating chamber, and which has on its side facing the cathode rotatably mounted substrate disks whose axes of rotation are each disposed transversely of the plane of movement of the substrate carriage. On the side of the substrate carriage facing away from the cathode, motor-driven shafts equipped with permanent magnets are journaled in the coating chamber with their longitudinal axes extending in a plane parallel to the plane of movement of the substrate carriage, and they produce a disk current in rotor disks which are affixed co-rotationally to the substrate disks. As a result of the disk current, the rotor disks, and with them the substrate disks, are set in rotation as they pass by the shafts.
REFERENCES:
patent: 3785853 (1974-01-01), Kirkman et al.
patent: 4548695 (1985-10-01), Sellschopp
patent: 4701251 (1987-10-01), Beardow
Kemmerer Guenther
Wolf Hans
Leybold-Heraeus GmbH
Weisstuch Aaron
LandOfFree
Apparatus for the production of coatings with a uniform thicknes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for the production of coatings with a uniform thicknes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the production of coatings with a uniform thicknes will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-866784