Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-01-13
1993-01-19
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, G01N 2726, B01D 5702
Patent
active
051804808
ABSTRACT:
An apparatus (1) is used for the preparation or extraction of samples, especially for analytical purposes, from a liquid or using a carrier liquid, where only very little liquid and substrate is available or is to be used and where the sample separation is to be carried out very quickly. For this, the apparatus (1) comprises, etched or machined into a plate-shaped body (8), an essentially planar flow bed (10) which has inlets and outlets arranged at opposing ends in the direction of flow, and is covered and sealed on the processing side of the plate-shaped body (8) by a further plate, so that the flow bed (10), which has an approximately groove-shaped flat cross-section, is sealed on all sides. There extend parallel to the flow bed (10), but also machined or etched into the plate-shaped body (8), electrode chambers (13), which are connected by way of electrodes (13b) to a current source (13a) in order to generate an electric field in the flow bed (10) transversely to the direction of flow. The electrode chambers (13) are connected to the flow bed (10) by way of very fine channels (14) extending transversely to the direction of flow which permit voltage transmission but practically no transport of material, that is to say act in a similar manner to membranes. Etching technology permits a miniaturized construction of the apparatus (1).
REFERENCES:
patent: 3364481 (1969-08-01), Richman
patent: 3847773 (1974-11-01), Snyder
patent: 4061560 (1977-12-01), Hannig
Howery et al., Journal of Chromatographic Science, vol. 10, Sep., 1972, pp. 557-559.
McCreight et al., AIAA Journal, vol. 16, No. 5, May, 1978.
Ciba-Geigy Corporation
Mathias Marla J.
Miller John T.
Niebling John
Starsiak Jr. John S.
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