Apparatus for the preparation of a functional deposited film by

Details Apparatus for the preparation of a functional deposited film by Apparatus for the preparation of a functional deposited film by

1990-02-20

1992-05-12

Padgett, Marianne

Coating processes

Electrical product produced

Welding electrode

427 541, 427 55, B05D 306

Patent

active

051126478

ABSTRACT:
An improvement in the photochemical vapor deposition apparatus for the preparation of a functional deposited film on a substrate by exciting and decomposing, or polymerizing a raw material as by way of a photochemical reaction, which comprises a reaction chamber with a raw material gas introducing means and an exhaust means, a radiant light transmissive window and a means to supply a light energy through the light transmissive window to the raw material gas introduced into the reaction space of the reaction chamber. The improvement comprises providing the above apparatus with a means to irradiate an infrared energy ray containing a wavelength having a vibrational absorption power for the raw material gas molecule concurrently with the irradiation of light energy.
The improved photochemical vapor deposition apparatus enables one to stably and repeatedly prepare a desired functional deposited film of high quality and having a wealth of practically applicable characeristics at an improved film deposition rate without foreign matter resulting from the raw material gas being deposited on the inner face of the light transmissive window.

REFERENCES:
patent: 4558660 (1985-12-01), Nishizawa
patent: 4581249 (1986-04-01), Kamiya
patent: 4626449 (1986-12-01), Hirai
patent: 4699863 (1987-10-01), Sawatari
patent: 4828874 (1989-05-01), Hiraoka et al.
West, J. Vac Sci Technology A, 3(6), Nov./Dec. 1985, pp. 2278-2282.
Hanabusa, Appl. Phys. Lett. 35(8), Oct. 15, 1979, pp. 626-627.
Webster's New Collegiate Dictionary, .COPYRGT.1973, G & C Merriam Co., Springfield, Mass., p. 664.

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