Apparatus for the plasma treatment of semiconductors

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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Details

156643, 156646, 204192E, 204192EC, 204298, 250527, 250531, 250542, B28D 506, H05H 124

Patent

active

041752350

ABSTRACT:
Apparatus for the plasma treatment of semiconductors comprises a plasma generating section, means for introducing a gas suitable for plasma treatment into the plasma generating section, high-frequency discharging means for activating the gas contained in said plasma generating section, a treatment section for treating semiconductor substrates with the activated gas, evacuation means for exhausting the gas, and discharge starting means positiioned in a region including the plasma generating section and its neighborhood, whereby a discharge can be started quickly and assuredly.

REFERENCES:
patent: 3485666 (1969-12-01), Sterling et al.
patent: 3501675 (1970-03-01), Cleaver et al.
patent: 3551312 (1970-12-01), Kahng et al.
patent: 4065369 (1977-12-01), Ogawa et al.

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