Apparatus for the photoresist development process of an integrat

Details Apparatus for the photoresist development process of an integrat Apparatus for the photoresist development process of an integrat

1997-09-17

1999-01-05

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396604, 396627, 118 52, G03D 500

Patent

active

058571272

ABSTRACT:
An apparatus for use in the photoresist development process of an integrated circuit fabrication is provided to improve the uniformity of development. The apparatus includes: a holder which includes a vertical spindle and a chuck fixed on the top of the vertical spindle, for horizontally holding a semiconductor wafer; a liquid feeder disposed above the holder, for supplying a developer onto the semiconductor wafer; a cup-type housing disposed under the holder, wherein the bottom of the cup-type housing includes a valve for draining the developer and a hole for allowing the vertical spindle to penetrate through; and a hoisting instrument fixed on the bottom of the cup-type housing, so that when the cup-type housing is lifted, the edge of the semiconductor wafer tightly contacts the sidewall of the cup-type housing, thereby forming a dish-like container for containing the developer.

REFERENCES:
patent: 5294257 (1994-03-01), Kelly et al.
patent: 5415691 (1995-05-01), Fujiyama et al.
patent: 5601645 (1997-02-01), Nonomura et al.

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