Apparatus for the photolithographic manufacture of integrated ci

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

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355 75, G03B 2752

Patent

active

045098522

ABSTRACT:
Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

REFERENCES:
patent: 2073287 (1937-03-01), Sandvik
patent: 3115815 (1963-12-01), Friedel
patent: 3614223 (1971-10-01), Ott
patent: 3648587 (1972-03-01), Stevens
patent: 3893763 (1975-07-01), Ott

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