Apparatus for the non-destructive measurement of the ohmic resis

Details Apparatus for the non-destructive measurement of the ohmic resis Apparatus for the non-destructive measurement of the ohmic resis

1989-04-27

1990-11-06

Eisenzopf, Reinhard J.

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

324709, 324720, G01R 2702

Patent

active

049689479

ABSTRACT:
The invention concerns apparatus for the non-destructive measurement of the ohmic resistance of thin layers. The apparatus is based on a capacitative measurement process wherein the plates of a capacitor are formed by an electrode (3) with the thin layer (6) to be measured, the dielectric of the capacitor being constituted by a carrier foil (5) on which the thin layer (6) is carried, for instance by means of a vacuum-depositing process. The electrode (3) is supplied via an oscillator with high-frequency voltage (U.sub.HF) so that a displacement current flows from the electrode (3) over the carrier foil (5) to the thin layer (6) and from there back again. This displacement current is composed of an ohmic part and a capacitive part. In order to maintain the capacitative part constant even for fluctuating capacitances, caused e.g. by changes in the thickness of the carrier foil (5), an additional capacitor is connected in a regulated manner to the capacitor that is present.

REFERENCES:
patent: 3723885 (1973-03-01), Urmenyi
patent: 4208624 (1980-05-01), Miller
patent: 4208625 (1980-05-01), Piso
patent: 4290008 (1981-09-01), Hoshino et al.
patent: 4569445 (1986-02-01), Kovats et al.
patent: 4682105 (1987-07-01), Thorn

Affiliated with

Also associated with

Rating

Apparatus for the non-destructive measurement of the ohmic resis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the non-destructive measurement of the ohmic resis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the non-destructive measurement of the ohmic resis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1308844