Apparatus for the measurement of the thickness and concentration

Details Apparatus for the measurement of the thickness and concentration Apparatus for the measurement of the thickness and concentration

1987-12-16

1990-09-25

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Fluorescence

378 45, 378 48, 378 49, 378 50, G01N 23223

Patent

active

049598481

ABSTRACT:
A device which measures both the thickness of a thin film and the concentration of selected elements within the thin film. An X-ray source is utilized to irradiate the thin film sample and two detectors, an energy dispersive detector and a wavelength dispersive detector, provide the film thickness and element concentration measurements respectively.

REFERENCES:
patent: 2132174 (1938-10-01), Machlett
patent: 2504706 (1950-04-01), Lempert et al.
patent: 2837655 (1958-06-01), Lang
patent: 2837656 (1958-06-01), Hendee et al.
patent: 2846589 (1958-08-01), Pellissier et al.
patent: 2924715 (1960-02-01), Hendee et al.
patent: 3196272 (1965-07-01), Culbertson
patent: 3198944 (1965-08-01), Furbee
patent: 4150288 (1979-04-01), Inoue et al.
patent: 4162528 (1979-07-01), Maldonado et al.
patent: 4236072 (1980-11-01), Schinkel et al.
patent: 4365156 (1982-12-01), Golouchenko et al.
patent: 4646341 (1987-02-01), Finer et al.
patent: 4696023 (1987-09-01), Kuusi
patent: 4764945 (1988-08-01), Tadahiro

Affiliated with

Also associated with

Rating

Apparatus for the measurement of the thickness and concentration does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the measurement of the thickness and concentration, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the measurement of the thickness and concentration will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-333605