Coating apparatus – Gas or vapor deposition – Running length work
Patent
1982-11-12
1985-05-07
Smith, John D.
Coating apparatus
Gas or vapor deposition
Running length work
118719, 118723, 118724, 118 501, 343771, 427 39, 427 451, C23C 1310
Patent
active
045151075
ABSTRACT:
An apparatus for manufacturing photovoltaic devices of the type including a plurality of layers of semiconductor materials deposited onto a substrate includes a plurality of deposition chambers, each chamber arranged to deposit a respective one of the layers of semiconductor materials onto the substrate as the substrate is advanced therethrough. At least one of the deposition chambers is coupled to a source of microwave energy to form a microwave energy excited glow discharge plasma within the at least one deposition chamber for depositing at least one of the layers of semiconductor material onto the substrate from the microwave energy excited glow discharge plasma within the at least one deposition chamber.
Also disclosed is an assembly for depositing a material onto a substrate from a microwave energy excited plasma. The assembly includes a deposition chamber, a source of microwave energy, and an antenna extending into the chamber and coupled to the microwave energy source. The antenna includes an outer sheath formed from a conductive material, an inner conductor extending within and electrically insulated from the outer sheath, and a slot within the outer sheath. The assembly also includes a new and improved feed-through for the antenna permitting the antenna to extend into the chamber while establishing a vacuum seal between the chamber and the antenna.
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Doehler Joachim
Fournier Eugene
Plantz Bernard F.
Smith John D.
Sovonics Solar Systems
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