Apparatus for the inward and outward transfer of a workpiece in

Details Apparatus for the inward and outward transfer of a workpiece in Apparatus for the inward and outward transfer of a workpiece in

1990-08-27

1992-05-12

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429828, 118719, 118730, 414217, 414223, C23C 1456

Patent

active

051124696

ABSTRACT:
An apparatus for the inward and outward transfer of a workpiece, particularly of a disk-shaped substrate in a vacuum chamber having a coating system comprising a cathode station. A conveyor means designed as a rotary table is situated inside the vacuum chamber. The rotary table accepts substrate holders which are designed as turned parts. A supporting plate is provided in the region of the inward transfer station. It supports the substrate holder and prevents a sagging thereof. The supporting plate also presses the substrate holder against the inside wall of the vacuum chamber; i.e. against a seal situated in the inside wall. As a result thereof, an air-tight separation of the inward transfer chamber from the vacuum chamber and from the atmosphere is achieved. A considerable reduction in the moved masses of the rotating component parts is achieved by a skillful designing and arrangement of the component parts. A reduction in the mass moments of inertia associated therewith results since the process cycles of the coating system can sequence more quickly.

REFERENCES:
patent: 3915117 (1975-10-01), Schertler
patent: 4756815 (1988-07-01), Turner et al.
patent: 4869801 (1989-09-01), Helms et al.
patent: 4886592 (1989-12-01), Anderle et al.
patent: 4938858 (1990-07-01), Zejda
patent: 4943363 (1990-07-01), Zejda et al.

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