Apparatus for the formation of a functional deposited film using

Details Apparatus for the formation of a functional deposited film using Apparatus for the formation of a functional deposited film using

1987-09-28

1989-06-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118733, 118501, C23C 1600

Patent

active

048401390

ABSTRACT:
An improved apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process is characterized in that an opening and shutting member to form an opening for taking a substrate in or out a deposition chamber and the circumferential wall of the deposition chamber are sealed by an electromagnetic wave shielding means and a vacuum sealing means being arranged in this order from the side of the microwave plasma generating space, which prevent deterioration of the vacuum sealing means and makes it possible to repeatedly form a desired functional deposited film of high quality at a high deposition rate.

REFERENCES:
patent: 4365587 (1982-12-01), Hirose
patent: 4430138 (1984-02-01), Suzuki
patent: 4450787 (1984-05-01), Weakliem
patent: 4534314 (1985-08-01), Ackley
patent: 4582773 (1986-04-01), Johncock et al.

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