Apparatus for the efficient coating of substrates

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S255280, C427S255310

Reexamination Certificate

active

07727588

ABSTRACT:
A process for the coating of substrates comprising insertion of a substrate into a process oven, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a metered chemical withdrawal subsystem, and a vaporization subsystem.

REFERENCES:
patent: 5252134 (1993-10-01), Stauffer
patent: 5665639 (1997-09-01), Seppala et al.
patent: 5943550 (1999-08-01), Fulford et al.
patent: 6136725 (2000-10-01), Loan et al.
patent: 6214729 (2001-04-01), Uhlenbrock et al.
patent: 6240874 (2001-06-01), Pike
patent: 2107360 (1983-04-01), None
patent: 04154953 (1992-05-01), None
Bunshah et al. “Deposition Technologies for Films and Coatings: Developments and Applications” 1982, Noyes Publications, Park Ridge, NJ, p339.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for the efficient coating of substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the efficient coating of substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the efficient coating of substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4240760

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.