Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1984-11-30
1986-06-03
Plantz, Bernard F.
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723, 118729, 118 501, 118733, 118726, 118500, 414217, C23C 1456, C23C 1650
Patent
active
045923060
ABSTRACT:
Compact and versatile apparatus for deposition of multi-layer coatings on substrates at reduced pressure comprises at least 3 and preferably at least 4 evacuable deposition chambers, means for evacuating each of said deposition chambers and coating means in each of said deposition chambers for depositing a coating layer on a substrate; an evacuable transfer chamber with closable ports between said transfer chamber and each of said coating chambers for transfer of a substrate to be coated between said deposition chambers; means for evacuating said transfer chamber; and transfer means for transferring a substrate between said deposition chambers via the transfer chamber. The apparatus is especially useful for the production of photovoltaic cells in which the active layers are formed of amorphous silicon deposited from a glow discharge.
REFERENCES:
patent: 3404661 (1968-10-01), Mathias et al.
patent: 3931789 (1976-01-01), Kakei et al.
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4201152 (1980-05-01), Luscher
patent: 4498416 (1985-02-01), Bouchaib
patent: 4500407 (1985-02-01), Boys et al.
patent: 4508049 (1985-04-01), Behn et al.
patent: 4508590 (1985-04-01), Kaplan
patent: 4542712 (1985-09-01), Sato
Pilkington Brothers P.L.C.
Plantz Bernard F.
LandOfFree
Apparatus for the deposition of multi-layer coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for the deposition of multi-layer coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the deposition of multi-layer coatings will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1227508