Apparatus for the controlled delivery of vaporized chemical prec

Details Apparatus for the controlled delivery of vaporized chemical prec Apparatus for the controlled delivery of vaporized chemical prec

1995-09-01

1997-01-21

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

118724, 118725, 118726, C23C 1600

Patent

active

055956033

ABSTRACT:
An apparatus and method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor is disclosed. A liquid flow controller is closely coupled with a highly efficient liquid vaporizer. The liquid flow controller, which contains no moving parts or polymeric seals, employs as a basic element an efficient gas-liquid separator downstream of the flow control element which assures that an uninterrupted constant velocity flow of liquid enters the high-temperature zone of the vaporizer. When the output of the vaporized-precursor delivery system is linked with the gas inlet of an LPCVD reactor, the very precise vapor delivery rates obtained translate into very precisely controlled thin film deposition rates.

REFERENCES:
patent: 4708884 (1987-11-01), Chandross et al.
patent: 4947790 (1990-08-01), G artner et al.
patent: 5134963 (1992-08-01), Barbee et al.
patent: 5203925 (1993-04-01), Shibuya et al.
patent: 5232869 (1993-08-01), Frigo et al.
patent: 5314727 (1994-05-01), McCormick et al.
patent: 5316579 (1994-05-01), McMillan et al.

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