Apparatus for the continuous etchings and aluminum plating of st

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

20429835, 20412935, 427432, 118419, C23F 404

Patent

active

052620336

ABSTRACT:
This method combines etching of the strip by passing through reduced pressure electric plasma discharge zones and the direct off-line dip-coating of the etched strip in a bath of molten aluminum.
The strip brought to cathode potential defilades continuously in registration with the magnet elements and anodes of a plurality of consecutively disposed magnetron devices and, therefore, directly into said molten metal bath.

REFERENCES:
patent: 4361472 (1982-11-01), Morrison, Jr.
patent: 4883723 (1989-11-01), Kilbane et al.

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