Apparatus for the coating of material on a substrate using a mic

Details Apparatus for the coating of material on a substrate using a mic Apparatus for the coating of material on a substrate using a mic

1992-06-01

1994-05-10

Gensler, Paul

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511121, 31511141, 31511171, 2041921, 20429802, 20429804, 20429805, 118723R, 118729, 333248, 423289, 427233, H01J 724

Patent

active

053111036

ABSTRACT:
An improved radiofrequency wave apparatus (10) which provides a relatively large diameter (on the order of magnitude 500 millimeters) plasma (56) for the coating of a material on a surface of a substrate (50) is described. The apparatus has a movable stage (54), which is used to change the position of the substrate with respect to the plasma. The radiofrequency waves are preferably microwaves or UHF waves (2.45 GHz or 915 MHg). The apparatus has a probe (30) which is mounted along the longitudinal axis (A--A) through a sliding short (16). The apparatus operates in the TM mode and is particularly useful for uniformly coating a relatively large surface of the substrate (or a number of smaller surfaces of substrates at the same time) with a material which is formed in the plasma. The apparatus has been used for depositing diamond films on a number of substrates (Si, Si.sub.3 N.sub.4 and the like).

REFERENCES:
patent: 3030187 (1962-04-01), Eversole
patent: 3030188 (1962-04-01), Eversole
patent: 4585668 (1986-04-01), Asmussen et al.
patent: 4691662 (1987-09-01), Asmussen et al.
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4777336 (1988-10-01), Asmussen et al.
patent: 4792772 (1988-12-01), Asmussen
patent: 4906900 (1990-03-01), Asmussen
patent: 4940015 (1990-07-01), Kobashi et al.
patent: 4943345 (1990-07-01), Asmussen et al.
F. P. Bundy, H. T. Hall, H. M. Strong, and R. H. Wentoff, Jr., "Man-made Diamond", Nature, 176, 51 (1955).
J. C. Angus, H. A. Will, and W. S. Stanko, J. Appl. Phys. 39, 2915 (1968).
B. V. Deryaguin et al., J. Cryst. Growth 2, 380 (1968).
B. V. Spitsyn et al, J. Cryst. Growth 52, 219 (1981).
S. Matsumoto et al, Jpn. J. Appl. Phys. 21 part 2, L183 (1982).
S. Matsumoto et al, J. Mater. Sci., 17, 3106 (1982).
M. Kamo et al, J. Cryst. Growth 62, 642 (1983).
S. Matsumoto et al, J. Mater. Sci., 18, 1785 (1983).
S. Matsumoto, J. Mater. Sci. Lett, 4, 600 (1985).
S. Matsumoto et al, Appl. Phys. Lett., 51, 737 (1987).
K. Suzuki et al, Appl. Phys. Lett. 50, 728 (1987).
C. V. Deshpandey et al, Vac Sci. Technol. A7, 2294 (1989).
W. Zhu et al, Proc. IEEE 79, No. 5, 621 (1991).
H. Kawarada, K. et al, Jpn. J. Appl. Phys. 26, L1032 (1987).
P. K. Bachmann et al, Extended Abstracts Diamond & Diamond-like Materials Synthesis, Materials Research Society Pittsburgh, Pa. 1988, p. 99.
J. Zhang et al, J. Vac. Sci. Technol. A 8, 2124 (1990).

Affiliated with

Also associated with

Rating

Apparatus for the coating of material on a substrate using a mic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the coating of material on a substrate using a mic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the coating of material on a substrate using a mic will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2414551