Apparatus for the chemical-mechanical polishing of wafers

Abrading – Machine – Rotary tool

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451254, 451258, B24B 500, B24B 2900

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active

059646527

ABSTRACT:
An apparatus for the chemical-mechanical polishing of wafers has a rotating disk provided with a polishing body, a supply device for a polishing fluid and a holding device for the wafer. An axis of the disk runs parallel to the surface of the wafer. A cylindrical edge surface of the disk is provided with the polishing body in such a way that a trench with a specific cross section can be made in the wafer.

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patent: 5735731 (1998-04-01), Lee
"Wafer bonding", W. P. Maszara, Microelectronic Engineering, vol. 22, 1993, pp. 301-302.
Japanese Patent Abstract No. 4-263425 (Udou), dated Sep. 18, 1992.
Japanese Patent Abstract No. 55-58984, dated May 2, 1980.

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