Apparatus for the automatic alignment of two superimposed object

Details Apparatus for the automatic alignment of two superimposed object Apparatus for the automatic alignment of two superimposed object

1981-01-13

1983-10-11

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250237R, G01B 1100, G06F 1546

Patent

active

044088850

ABSTRACT:
An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual mannner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan output signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment. A tolerance selection control circuit is provided for permitting a variation in final alignment tolerance.

REFERENCES:
patent: 3437816 (1969-04-01), Mushinsky
patent: 3490846 (1970-01-01), Kasper
patent: 3511551 (1970-05-01), Matulka
patent: 3560097 (1971-02-01), Gavrilkin et al.
patent: 3569720 (1971-03-01), Fredriksen
patent: 3955072 (1976-05-01), Johannsmeier et al.

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