Apparatus for the application of thin layers to a substrate

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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20419212, 20429807, 20429808, 20429811, 20429814, 20429816, 20429819, 20429823, 20429824, C23C 1435

Patent

active

049465767

ABSTRACT:
The invention concerns apparatus for the application of thin layers on a substrate by means of a cathode sputtering process. A mechanical shutter is provided between a cathode to be sputtered and an anode, which shutter divides the space between the cathode and the substrate to be coated. In addition, glow discharge means is provided both between the anode and the shutter.

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