Apparatus for the application of thin layers to a substrate

Details Apparatus for the application of thin layers to a substrate Apparatus for the application of thin layers to a substrate

1989-02-14

1990-08-07

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429807, 20429808, 20429811, 20429814, 20429816, 20429819, 20429823, 20429824, C23C 1435

Patent

active

049465767

ABSTRACT:
The invention concerns apparatus for the application of thin layers on a substrate by means of a cathode sputtering process. A mechanical shutter is provided between a cathode to be sputtered and an anode, which shutter divides the space between the cathode and the substrate to be coated. In addition, glow discharge means is provided both between the anode and the shutter.

REFERENCES:
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patent: 4169031 (1979-09-01), Brors
patent: 4218495 (1980-08-01), Takagi et al.
patent: 4294678 (1981-10-01), Kuehnle
patent: 4392931 (1983-07-01), Maniv et al.
patent: 4395323 (1983-07-01), Denton et al.
patent: 4401539 (1983-08-01), Abe et al.
patent: 4428812 (1984-01-01), Sproul
patent: 4447305 (1984-05-01), Heindl et al.
patent: 4492620 (1985-01-01), Matsuo et al.
patent: 4572842 (1986-02-01), Dietrich et al.

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