Apparatus for synthetic diamond deposition including spring-tens

Details Apparatus for synthetic diamond deposition including spring-tens Apparatus for synthetic diamond deposition including spring-tens

1990-01-25

1990-11-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118725, 118728, 156DIG68, 423446, C23C 1646

Patent

active

049709860

ABSTRACT:
Diamond is deposited by chemical vapor deposition on two parallel substrates, by means of a plurality of filaments between said substrates. The substrates and filaments are in vertical configuration and the filaments are linear and spring-tensioned to compensate for thermal expansion and expansion caused by filament carburization. The apparatus includes at least one and preferably two temperature controlling means, usually heat sinks, to maintain substrate temperature in the range of 900.degree.-1000.degree. C., for optimum rate of diamond deposition.

REFERENCES:
patent: 4306515 (1981-12-01), Winkler
patent: 4481232 (1984-11-01), Olson
Chemical & Engineering News, vol. 67, No. 20 (May 15, 1989), pp. 24-39.

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