Apparatus for synthetic diamond deposition including curved fila

Details Apparatus for synthetic diamond deposition including curved fila Apparatus for synthetic diamond deposition including curved fila

1989-08-03

1990-09-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118725, 156DIG68, 427 50, C23C 1646

Patent

active

049534998

ABSTRACT:
Diamond is deposited by chemical vapor deposition on two parallel substrates, by means of a plurality of filaments between the substrates. The substrates and filaments are in vertical configuration and the filaments are prestressed to curve in a single plane parallel to the substrates, to allow for thermal expansion and expansion caused by filament carburization. The apparatus includes at least one and preferably two heat sinks to maintain substrate temperatures in the range of 900.degree.-1000.degree. C., for optimum rate of diamond deposition.

REFERENCES:
patent: 4593644 (1986-06-01), Hanak
patent: 4816291 (1989-03-01), Desphandey et al.
patent: 4859490 (1989-08-01), Ikegaya et al.

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