Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-05-24
1991-02-05
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
427 39, 423446, C23C 1648, C23C 1650
Patent
active
049895427
ABSTRACT:
An apparatus for synthesizing diamond, which comprises a reaction chamber, a means for supplying to the reaction chamber a gas mixture comprising a hydrogen gas and an organic compound decomposable by a plasma to form a diamond or a gas mixture comprising a hydrogen gas, an inert gas and said organic compound, a means of conducting a microwave of frequency larger than 300 MHz to the reaction chamber to generate a microwave plasma in the gas mixture and a substrate held by a substrate holder to locate in the microwave plasma and on which diamond is to be formed, wherein the microwave conducting means is designed to introduce the microwave to the reaction chamber from a plurality of directions.
REFERENCES:
patent: 3911318 (1975-10-01), Spero
patent: 4729341 (1988-03-01), Fournier
patent: 4776918 (1988-10-01), Otsubo
patent: 4869924 (1989-09-01), Ito
Kawarada et al, Japanese Journal of Applied Physics vol. 26, No. 6, Jun., 1987 pp. L1032-L1034.
Bueker Richard
National Institute for Research in Inorganic Materials
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