Apparatus for supplying CVD coating devices

Details Apparatus for supplying CVD coating devices Apparatus for supplying CVD coating devices

1993-10-28

1996-01-02

Breneman, R. Bruce

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118666, 118688, 118692, 118710, 118715, 118724, 118726, B05C 1102, B05C 1110, C23C 1652

Patent

active

054804884

ABSTRACT:
An apparatus supplies CVD coating devices with coating gas and includes an intermediate reservoir for accommodation of the gaseous coating material arranged between a storage tank and a coating device. The volume of the reservoir is set to a predetermined, maximum pressure change in the intermediate reservoir upon withdrawal of the mass of gas required for a coating step. The intermediate reservoir can be connected to a gas recovery station.

REFERENCES:
patent: 4314837 (1982-02-01), Blankenship
patent: 4488506 (1984-12-01), Heinecke et al.
patent: 4545801 (1985-10-01), Miyajiri et al.
patent: 5069930 (1991-12-01), Hussla et al.
patent: 5186120 (1993-02-01), Ohnishi et al.
patent: 5252134 (1993-10-01), Stauffer
Patent Abstracts of Japan (C-791), vol. 14, No. 578, Dec. 21, 1990 (abstract of JP-A-2-250977).

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