Apparatus for stripping photoresist and method thereof

Details Apparatus for stripping photoresist and method thereof Apparatus for stripping photoresist and method thereof

2002-12-09

2010-06-22

Markoff, Alexander (Department: 1792)

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

C134S002000, C134S010000, C134S034000, C134S040000, C134S094100, C134S099100, C134S099200

Reexamination Certificate

active

07740709

ABSTRACT:
An apparatus for removing a photoresist from a substrate which includes a stripping bath chamber, a conveying unit conveying a substrate containing a photoresist through the stripping bath chamber, a photoresist stripper material supplying unit positioned to dispense the photoresist stripper material to the substrate while the substrate is disposed in the stripping bath chamber, an antifoaming agent supplying unit disposed in the stripping bath chamber dispensing an antifoaming agent toward the photoresist stripper material in the stripping bath chamber, an antifoaming agent storing unit communicating with the antifoaming agent supplying unit supplying the antifoaming agent thereto, and a stripper storing unit operatively connected to the stripper supplying unit supplying stored photoresist stripper material thereto.

REFERENCES:
patent: 3880685 (1975-04-01), Rehm et al.
patent: 4190481 (1980-02-01), Goffredo
patent: 5246023 (1993-09-01), Breunsbach et al.
patent: 5671760 (1997-09-01), Nakagawa et al.
patent: 6302600 (2001-10-01), Nagase et al.
patent: 7109037 (2006-09-01), Nakagawa et al.
patent: 2003/0073242 (2003-04-01), Kitchens et al.
patent: 2001-332528 (2001-11-01), None
patent: 2000-0013481 (2000-07-01), None
patent: 2001-0055353 (2001-07-01), None

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