Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1977-12-27
1979-04-24
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 33, 118218, 118320, 118416, 118503, C23C 1500
Patent
active
041510640
ABSTRACT:
Apparatus for sputtering printing or similar type cylinders by means of r.f. sputtering in which a cylindrical metal substrate is mounted on a mandrel which is installed in a sputtering chamber. The apparatus includes targets arranged around the cylindrical substrate, the substrate comprising the anode or being mounted on the anode. The sputtering operation is arranged to apply a highly uniform coating of a photoconductive material on the substrate and the structure is arranged so that the finished cylinder can be removed from the sputtering chamber along with the mandrel and replaced by another metal cylindrical substrate on another mandrel. In this way a printing cylinder comprising a seamless thin-walled metal sleeve having a coating of photoconductive material is easily produced economically and rapidly, said coating having uniform thickness and properties throughout.
REFERENCES:
patent: 2233070 (1941-02-01), Atwell et al.
patent: 2721535 (1955-10-01), Zitkus
patent: 3556004 (1971-01-01), Mitter et al.
patent: 3649502 (1972-03-01), Herte et al.
patent: 3650737 (1972-03-01), Maissel et al.
patent: 3818982 (1974-06-01), Wagner
patent: 4014779 (1977-03-01), Kuehnle
Coulter Stork U.S.A., Inc.
Weisstuch Aaron
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