Apparatus for sputter coating discs

Details Apparatus for sputter coating discs Apparatus for sputter coating discs

1986-02-03

1987-10-20

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

414217, 414222, C23C 1434

Patent

active

047012510

ABSTRACT:
Apparatus for sputter coating a disc comprises an evacuable chamber with a disc entry and exit opening. A disc to be coated is supported at the center of the disc by support means and drive means move the support means along a disc path between a disc loading position outside the chamber and a disc coating position within the chamber. Inside the chamber are two pivotally mounted cathodes each having coating material to be sputtered applied to a surface thereof. The cathodes are mounted to pivot between the withdrawn position lying clear of the disc path and operating position wherein the cathodes lie one to each side of the disc when this is in the coating position. Means are provided for rotating the support means and thus the disc about the disc center when in the coating position and during such rotation coating material is sputtered from the cathodes simultaneously onto both sides of the disc.

REFERENCES:
patent: 3294670 (1966-12-01), Charschan et al.
patent: 3521765 (1970-07-01), Kaufman et al.
patent: 4260466 (1981-04-01), Shirahata et al.
patent: 4417968 (1983-11-01), McKelvey
patent: 4422916 (1983-12-01), McKelvey
patent: 4485911 (1984-12-01), Cameron
patent: 4500407 (1985-02-01), Boys et al.
patent: 4558388 (1985-12-01), Graves, Jr.
patent: 4595483 (1986-06-01), Mahler

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