Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-02-16
1995-01-17
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041922, 20429828, C23C 1434
Patent
active
053823451
ABSTRACT:
An apparatus for coating a magneto-optical recording medium film onto a disk substrate are provided. For proceeding the sputtering processes, a sputtering target containing Tb, Fe, and Co composition is prepared and placed in a sputtering gun which is served as a sputtering source. Facing to the sputtering gun, a clamping mechanism having a plurality of clampers arranged around the clamping mechanism is provided for clamping disk substrate thereon. During sputtering processes, the clamping mechanism is rotated about its axial center, and at the same time each clamper of the clamping mechanism is rotated about its axial center respectively. The clamper is designed in a form of facing the plane of the sputtering gun at a proper tilt angle, preferably 15 degrees, so that the disk substrate may be sputtered with a uniform thickness and composition of magneto-optical recording medium film thereon.
REFERENCES:
patent: 4790921 (1988-12-01), Bloomquist et al.
patent: 4926320 (1990-05-01), Yamada et al.
patent: 4956070 (1990-09-01), Nakada et al.
patent: 5181020 (1993-01-01), Furukawa et al.
Chao Shiuh
Hsiao Tsai-Chu
Huang Der-Ray
Industrial Technology Research Institute
Liauh W. Wayne
National Tsing Hua University
Nguyen Nam
LandOfFree
Apparatus for simultaneously coating a film of magneto-optical r does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for simultaneously coating a film of magneto-optical r, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for simultaneously coating a film of magneto-optical r will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-745493