Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1974-04-17
1976-03-09
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
241DIG7, 204300EC, C25D 1300
Patent
active
039430499
ABSTRACT:
This invention relates to a method and apparatus for creating high shear stresses in a particulate suspension prior to use of such suspension for imaging or inking. The method and apparatus in one environment function to stress a thin layer of an electrophoretic suspension of particles in a liquid carrier. The prestressed suspension is better suited than unstressed suspensions for preparing both monochromatic and polychromatic copies from originals by particle migration through the suspension when it is exposed to electromagnetic radiation in image configuration while in an electric field across the suspension between two electrodes. The method and apparatus is also used for printing inks in order to form a prestressed, uniform, thin layer of the ink for application to the press.
REFERENCES:
patent: 1435886 (1922-11-01), Acton et al.
patent: 2052131 (1936-08-01), Chappell
Petre David C.
Ralabate James J.
Smith Charles E.
Solomon W. I.
Tung T.
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