Apparatus for sensing low concentration NOx, chamber used for ap

Measuring and testing – Gas analysis – Impurity

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422 93, 436110, G01N 2404

Patent

active

060446897

ABSTRACT:
The disclosed apparatus for sensing low concentration NOx in a measurement gas especially in the atmosphere has at least a sensor element made of an oxide arranged in a flow path of the measurement gas, the resistance of the sensor element varying in response to changes in NOx concentration in the measurement gas. As suitable options of this type of the NOx sensor, there are disclosed a chamber used for an apparatus for sensing low concentration NOx, a gas sensor element and a method of manufacturing the gas sensor element, and an ammonia removing apparatus and an NOx sensor utilizing the ammonia removing apparatus.

REFERENCES:
patent: 4279618 (1981-07-01), Barden
patent: 4358950 (1982-11-01), Chang
patent: 4458242 (1984-07-01), Kusanagi et al.
patent: 4701739 (1987-10-01), Sasaki
patent: 4713646 (1987-12-01), Sunano et al.
patent: 4816414 (1989-03-01), Koocher et al.
patent: 4958514 (1990-09-01), Takami et al.
patent: 5211053 (1993-05-01), Nolting et al.
patent: 5302191 (1994-04-01), Koutrakis et al.
patent: 5389340 (1995-02-01), Satake
patent: 5705129 (1998-01-01), Takahashi et al.
patent: 5854077 (1998-12-01), Wolfson et al.

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