Apparatus for selective deposition of metal thin film

Details Apparatus for selective deposition of metal thin film Apparatus for selective deposition of metal thin film

1989-03-08

1990-12-25

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118725, 427 531, 427253, C23C 1600

Patent

active

049794663

ABSTRACT:
An apparatus for depositing metal thin film on predetermined portions of an underlayer of a substrate by a chemical deposition method with good selectivity, good reproducibility and high deposition rate. Hydrogen atoms are prevented from adhering to portions of the substrate not to be deposited with a metal using a light source for heating only the substrate while cooling other portions exposed to starting material gases or a special gas flow controlling plate or shading plate.

REFERENCES:
patent: 3621812 (1971-11-01), Hissong, Jr. et al.
patent: 4081313 (1978-03-01), McNeilly et al.

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