Apparatus for saturating a gas with the vapor of a liquid

Details Apparatus for saturating a gas with the vapor of a liquid Apparatus for saturating a gas with the vapor of a liquid

1982-04-19

1984-05-22

Chiesa, Richard L.

Gas and liquid contact apparatus

With external supply or removal of heat

Plural distinct contact zones

261 22, 261119R, 261121R, 261DIG65, B01F 304

Patent

active

044501188

ABSTRACT:
An apparatus for saturating a gas with the vapor of a liquid is formed by two chambers. In the first chamber the gas is passed through the liquid which has a higher temperature than the temperature at which the gas must ultimately have been saturated on leaving the apparatus. Thereafter, the gas is passed into a second chamber. The liquid in said chamber has the temperature at which the gas must be saturated.

REFERENCES:
patent: 1608251 (1926-11-01), Shook et al.
patent: 3434471 (1969-03-01), Liston
patent: 3615079 (1971-10-01), De Lara et al.
patent: 3864440 (1975-02-01), Giocoechea
patent: 4051205 (1977-09-01), Grant
patent: 4140735 (1979-02-01), Schumacher
patent: 4206745 (1980-06-01), Gilgen
patent: 4276243 (1981-06-01), Partus

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