Apparatus for roughening a substrate for photosensitive layers

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204228, 204DIG9, C25F 700

Patent

active

052718182

ABSTRACT:
A mechanically roughened substrate is conveyed through an electrolytic bath and is given a superposed electrochemical roughening, which is carried out by means of electrodes which are arranged in the electrolytic bath at a specific spacing from the substrate. The electrodes are connected to corresponding windings on the secondary side of a three-phase transformer. The corresponding windings on the primary side of the three-phase transformer are connected to a three-phase frequency converter, to which three-phase current is applied via leads. The three-phase frequency converter transforms the line frequency of the three-phase current supplied into a frequency range of about 50 to 300 Hz at a voltage of between about 1 and 380 V.

REFERENCES:
patent: 2901412 (1959-08-01), Mostovych et al.
patent: 4533444 (1985-08-01), Oda et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for roughening a substrate for photosensitive layers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for roughening a substrate for photosensitive layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for roughening a substrate for photosensitive layers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-306439

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.