Apparatus for replacing gas in storage container and method...

Details Apparatus for replacing gas in storage container and method... Apparatus for replacing gas in storage container and method...

2008-01-01

2008-01-01

Douglas, Steven O. (Department: 3771)

Fluent material handling, with receiver or receiver coacting mea

Processes

Gas or variation of gaseous condition in receiver

C141S098000, C141S066000, C414S217000, C414S939000, C414S940000

Reexamination Certificate

active

07314068

ABSTRACT:
While gas in a general storage container with no gas inlet and in the storage container with the gas inlet is replaced in a short time, the semiconductor wafer surface is cleaned. In an apparatus for replacing gas in a semiconductor wafer storage container which includes a lid unit and a storage container main body with a gas inlet, the apparatus includes gas introducing means for introducing the gas into the storage container main body, gas evacuating means for evacuating the gas in the storage container main body, and gas circulating means for circulating the gas in the storage container main body through a chemical adsorption filter. Gas introducing means for introducing the gas from a gap between the storage container main body and the lid unit while the lid unit is opened in the storage container mounting means is provided in the storage container with no gas inlet.

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patent: 2000-311936 (2000-11-01), None

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