Apparatus for removing liquid from substrates

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

216 92, B44C 122

Patent

active

057627495

ABSTRACT:
An apparatus for removing a treating liquid from main surfaces of a substrate that has undergone a wet surface treatment, includes a transport device for transporting the substrate, a first gas jetting device having a first jet opening for jetting a gas to a first main, upper surface of the substrate transported by the transport device, and a liquid removing chamber for preventing the treating liquid removed from the main surfaces of the substrate from scattering to ambient, the liquid removing chamber having a substrate inlet and a substrate outlet. A partition is mounted in the liquid removing chamber, with an upper end thereof contacting either an upper wall, a rear wall or a front wall of the liquid removing chamber. The partition extends between opposite side walls of the chamber parallel to direction of substrate transport. The partition divides an interior space of the chamber above the first main surface of the substrate into a first space upstream of the first jet opening with respect to the direction of substrate transport, and a second space downstream of the first jet opening with respect to the direction of substrate transport.

REFERENCES:
patent: 3935041 (1976-01-01), Goffredo et al.

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